Development is a crucial link in many industrial and technical fields. Foam often occurs during the development process. On the one hand, the interaction between the chemical substances in the developer may produce surfactants, which easily cause air to mix into the developer to form foam. On the other hand, stirring, rinsing and other operations during the development process will also involve a large amount of air, which in turn leads to the generation of foam. At this time, non-silicon defoamers for developers can quickly eliminate foam and ensure the stability of the development process.
Unlike silicone defoamers, non-silicon defoamers for developers will not leave silicon residues on the surface of the material after development. In the manufacture of electronic circuit boards, silicon residues may affect subsequent packaging and other processes, while in printing plate making, silicon residues may affect the adhesion of inks. In addition, non-silicon defoamers for developers have good compatibility with various chemical components in the developer. Whether it is an acidic, alkaline or neutral developer, it can exist stably and play a defoaming role, and will not chemically react with the components in the developer to affect the performance of the developer.
The active molecules of non-silicon defoamers for development can be adsorbed on the surface film of the foam, changing the physical properties of the foam film. It makes the foam film thinner and less tough, thereby destroying the stability of the foam and causing the foam to burst. The ingredients in the non-silicon defoamer can reduce the surface tension of the developer. When the surface tension is reduced to a certain level, it is difficult for the foam to form and maintain, thereby achieving the purpose of defoaming and suppressing foam.
Non-silicon defoamers for development play an irreplaceable role in the development process. Through its own characteristics and working principles, it effectively solves the foam problem in the development process, ensures the quality of the development effect, extends the service life of the equipment, and avoids possible problems such as silicon residue.